The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system.
The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

TWINSCAN XT:1060K

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