概述

The FPA-5000ES2 is a KrF Scanning Stepper from Canon that uses a 248nm KrF excimer laser to cover 0.18 micron to 0.15 micron design rules. It has a high numerical aperture (NA 0.68) and is dual era for wafer size, allowing users to shift from 200mm to 300mm wafer handling with a conversion kit. The high performance projection lens is assembled using Canon’s ULTiMA system, and the new FLAT II wafer stage has a lightweight and stiff structure for better stepping accuracy. The FPA-5000ES2 platform also features a reaction force receiver on both its reticle and wafer stages, active dampers, and synchronized scan exposure for impressive results in distortion, CD uniformity, wafer scan speed, and throughput.