概述

The ASML AT 1100 is a Steppers and Scanners system. The AT 1100 has Scanner 12". AT:1100 is a 193 nm wavelength system with the industry's highest numerical aperture ArF lens (NA=0.75). Build upon ASML's successful 300 mm TWINSCAN dual-stage platform introduced in July 2000. The AT:1100 achieves a throughput of 93 wafers-per-hour at a dose of 20 mJ/cm2. By separating the align and expose operations, more extensive and accurate alignment and wafer surface height mapping of the entire 300 mm wafer can be performed without impacting throughput. This increase in metrology accuracy is essential for delivering the 100 nm critical dimension control and less than 20 nm overlay across the wafer at full throughput. The AT:1100 introduces new 4 kHz ArF laser technology which contribute to its leading productivity advantage. The AT:1100 is designed for seamless mix-and-match operation with ASML's TWINSCAN product family.